Product Short Description
AMAT Semiconductor Process Component 0100-71271
Product Brief
Original OEM precision component manufactured by Applied Materials, dedicated to semiconductor wafer fabrication equipment. It is a standardized replacement part for thin film deposition, etching or vacuum process systems, compliant with semiconductor ultra-clean manufacturing standards.
Description
Model Series
AMAT 0100 Series Semiconductor Production Equipment Spare Parts
Technical Specifications
- Part Type: Vacuum & Process Chamber Structural Component
- Cleanliness Class: Class 100 Ultra-Clean Grade
- Operating Pressure: Full vacuum range for semiconductor process chambers
- Operating Temperature: 20 °C to 220 °C continuous working range
- Dimensional Tolerance: Micron-level precision machining tolerance
- Surface Roughness: Polished ultra-smooth finish for low particle generation
Functional Features
- Maintains airtightness of vacuum process chamber under long-term operation
- Provides structural support and positioning for internal process accessories
- Resists corrosion from process specialty gases and plasma environment
- Zero particle shedding during normal service cycle
Performance Parameters
- Air Tightness: Zero air leakage under rated vacuum condition
- Thermal Stability: No deformation or performance degradation under cyclic temperature changes
- Mechanical Strength: High rigidity to withstand internal equipment vibration
- Service Cycle: Fixed maintenance replacement cycle for semiconductor mass production lines
Material Composition
- Main Body: High-purity aluminum alloy with passivation treatment
- Sealing Auxiliary Parts: Semiconductor-grade fluoropolymer
- Fasteners: Stainless steel with anti-rust and anti-particle treatment
Structural Characteristics
- Integrated monolithic precision machined structure
- Standard positioning holes and mounting interfaces matching original equipment
- Streamlined surface design to avoid particle accumulation
- Reinforced stress-bearing zones for long-cycle industrial operation
Working Principle
Installed inside the semiconductor process vacuum chamber. It stabilizes the internal structural layout, maintains the rated vacuum environment required for wafer processing, and isolates external air and impurities. It cooperates with gas delivery and plasma systems to ensure continuous and stable execution of wafer manufacturing processes.
Advantage Highlights
- 100% dimensional and functional compatibility with original AMAT equipment
- Outstanding corrosion resistance against semiconductor process gases
- Ultra-low particle emission to guarantee wafer yield
- High structural rigidity with no fatigue deformation under cyclic operation
Applicable Industries
Semiconductor wafer manufacturing, integrated circuit fabrication, thin film technology, photovoltaic semiconductor production, microelectronics processing
Installation Requirements
- Perform all operations inside Class 100 ultra-clean workshop
- Use anti-static and non-metallic dedicated installation tools only
- Follow OEM specified torque values for all fastening points
- Verify vacuum tightness after full assembly before equipment startup
Usage Notes
- Strictly prohibit direct hand contact with functional surfaces during handling and installation
- Store in sealed vacuum packaging in dry ultra-clean storage area when not in use
- Replace according to scheduled equipment maintenance plan
- Prevent scratch, impact and surface contamination at all times
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