AMAT 0100-20100

Description

• Functional Features: Assists gas medium delivery, pipeline connection and flow auxiliary control in semiconductor process system; maintains purity of process medium.
• Performance Parameters: Medium Purity Requirement: Semiconductor high-purity grade; Working Pressure: Process pipeline standard pressure; Operating Temperature: 10°C to 80°C.
• Material Composition: Main body: high-purity corrosion-resistant alloy; internal flow channel: electropolished surface; sealing parts: semiconductor-grade high-purity elastomer.
• Structural Characteristics: Smooth internal flow channel, zero-dead-volume structure, quick-connect interface, compact modular structure.
• Working Principle: Transports high-purity process gas inside semiconductor equipment; relies on polished flow channel and high-purity material to avoid medium contamination and ensure process quality.
• Advantages & Highlights: Zero medium pollution, excellent corrosion resistance, smooth flow channel, reliable sealing, long service life in high-purity gas environment.
• Applicable Industries: Semiconductor wafer fabrication, thin film deposition, etching process, semiconductor material delivery system.
• Model Series: AMAT 0100 Series Semiconductor Process Auxiliary Components.
• Installation Requirements: Assemble in certified cleanroom; purge pipeline before operation; tighten interface according to standard torque; avoid foreign matter entering flow channel.
• Usage Notes: Only use specified high-purity process medium; prohibit overpressure operation; regularly inspect sealing integrity; keep external surface clean and particle-free.