LAM 810-002895-002

Product Short Description

Product Name: Semiconductor Gas Flow Control Auxiliary Component
Brief Introduction: Matching component for LAM gas flow control system, installed at the rear end of flow meter and valve group.
Technical Specifications: Adaptable gas flow range 0–500 sccm, working pressure 0–0.9 MPa, operating temperature 10 °C to 130 °C, interface standard VCR.

Functional Features: Stabilizes instantaneous gas flow, assists flow regulation, realizes pipeline transition and pressure stabilization.
Performance Parameters: Flow fluctuation suppression rate ≥ 95%, pressure stability ±0.005 MPa, continuous working life ≥ 48,000 hours.
Material Composition: 316L electropolished stainless steel + fluoropolymer buffer lining + metal hard seal structure.
Structural Characteristics: Built-in flow buffer cavity, straight-through flow channel, standard VCR flange interface, miniaturized integrated structure.
Working Principle: Buffers gas flow pulse in pipeline, stabilizes flow velocity and pressure, and ensures flow control accuracy of rear-end process equipment.
Advantages: Remarkable flow stabilization effect, standard universal interface, compact size, compatible with all mainstream gas flow control units.
Applicable Industries: Semiconductor process, photoelectric material production, vacuum coating, precision gas delivery system.
Series Information: LAM 810 Series Gas System Auxiliary Components, 002 is standard flow stabilization model.
Installation Requirements: Install horizontally along gas flow direction; tighten VCR joints with standard torque; keep upstream and downstream pipeline straight within 5 cm.
Usage Precautions: Avoid gas impact exceeding design flow; keep internal channel clean; disassemble and clean every 6 months in long-term operation.

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