Product Short Description
AMAT Semiconductor Gas Distribution Component 0100-71275
Product Brief
Genuine AMAT OEM component for gas delivery subsystems on semiconductor process tools. It controls and distributes specialty process gases, serving as a core part of gas pipeline assemblies for etching and deposition equipment.
Description
Model Series
AMAT 0100 Series Semiconductor Gas System Components
Technical Specifications
- Part Type: Precision Gas Flow Distribution Fitting
- Working Medium: Semiconductor industrial specialty process gases
- Maximum Working Pressure: 1.0 MPa rated working pressure
- Operating Temperature: -10 °C to 180 °C
- Sealing Standard: Semiconductor high-purity gas sealing specification
- Material Purity: Electronic-grade high-purity raw material
Functional Features
- Accurately distributes multi-channel process gases to reaction chambers
- Achieves full sealing for high-purity gas pipelines to prevent gas leakage
- Resists chemical erosion from corrosive process gases
- Maintains stable gas flow path without flow deviation
Performance Parameters
- Flow Uniformity: Consistent gas flow across all internal channels
- Leakage Rate: Complies with semiconductor ultra-low leakage standard
- Chemical Resistance: Long-term resistance to halogen and fluorine-based process gases
- Pressure Endurance: No structural damage under instantaneous pressure fluctuation
Material Composition
- Main Body: High-purity 316L stainless steel with electropolishing
- Internal Flow Channel: Smooth electropolished surface
- Connection Joints: Hard-seal metal connection structure
Structural Characteristics
- Multi-channel integrated flow path design
- Compact pipeline connection structure for limited equipment internal space
- Standard threaded and flange connection interfaces
- Fully welded internal structure with no dead volume for gas retention
Working Principle
Connected between main gas pipelines and process chambers. It divides and guides high-purity process gases into designated channels, controls gas delivery routes, and maintains pipeline sealing. It ensures stable, pure and uniform gas supply for wafer reaction processes.
Advantage Highlights
- Electropolished inner wall eliminates gas adsorption and particle generation
- Metal hard seal structure achieves permanent high airtightness
- Perfect matching with AMAT original gas system modules
- Long service life under continuous gas circulation condition
Applicable Industries
Semiconductor manufacturing, IC chip production, semiconductor material processing, flat panel display manufacturing
Installation Requirements
- Complete assembly in ultra-clean environment with gas safety protection measures
- Align channel directions strictly per equipment assembly drawings
- Tighten connectors following standard industrial torque specifications
- Conduct full gas leakage test after installation
Usage Notes
- Do not apply excessive force to threaded joints to avoid thread damage
- Keep internal flow channels free from dust and foreign particles
- Inspect sealing performance regularly during equipment routine maintenance
- Isolate from incompatible chemical media during storage and operation
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