AMAT 0090-07135

Description

• Input Voltage: 24 VDC
• Current Rating: 100–400 A
• Cooling: Oil-free design with integrated油气分离 system to prevent contamination
• Control: Automatic operation with fault alarm functionality

Functional Features

• High Efficiency: Delivers a high pumping speed of 1200 CFM, enabling rapid evacuation of process chambers.
• Ultra-Low Vacuum: Achieves an ultimate vacuum level of 10⁻⁹ Torr, critical for advanced semiconductor processes.
• Low Noise and Vibration: Operates quietly (<65 dB(A)) and with minimal vibration (<0.1 g), reducing interference with sensitive equipment.
• Long Lifespan: Designed for over 40,000 hours of continuous operation, minimizing downtime and maintenance costs.
• Oil-Free Design: Features an油气分离 system to prevent oil contamination in vacuum chambers, ensuring process purity.
• Automatic Control: Equipped with self-diagnostic capabilities and fault alarms for proactive maintenance.
• Compact and Modular: Fits standard ATCA platforms, facilitating easy integration into existing systems.

Application Scenarios

• Semiconductor Fabrication: Used in etching, deposition, and wafer cleaning processes to maintain ultra-high vacuum conditions.
• Thin-Film Deposition: Supports precise layer deposition by ensuring a contaminant-free environment.
• Photolithography: Essential for creating high-resolution patterns on wafers by maintaining stable vacuum levels.
• Packaging and Testing: Powers vacuum systems in semiconductor device packaging and final testing stages.
• Industrial Vacuum Systems: Suitable for other high-vacuum applications requiring reliability and low maintenance.

Advantages

• Proven Reliability: Trusted by leading semiconductor manufacturers worldwide.
• Cost-Effective: Reduces total cost of ownership through long service life and low maintenance requirements.
• Global Support: Backed by Applied Materials’ extensive service network and technical expertise.
• Scalability: Modular design allows easy upgrades or expansion to meet evolving production needs.